| Identification | Back Directory | [Name]
TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), | [CAS]
19782-68-4 | [Synonyms]
TDMAH
TDMAH: Hf(N(CH3)2)4
Hafnium(4+) dimethylamide
Hafnium tetradimethylamide
Dimethylamine hafnium(4+) salt
Tetrakis(dimethylamino)hafnium(IV) 99.999%
TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), 99.99+%
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH
Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems
Tetrakis(dimethylamido)hafnium(IV),TDMAH, Tetrakis(dimethylamino)hafnium(IV)
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok(R) cylinder (96-1071) for CVD/ALD
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD | [Molecular Formula]
C8H24HfN4 | [MDL Number]
MFCD01862473 | [MOL File]
19782-68-4.mol | [Molecular Weight]
354.796 |
| Chemical Properties | Back Directory | [Melting point ]
26-29 °C(lit.)
| [Boiling point ]
85°C/0.1mm | [density ]
1.098 g/mL at 25 °C | [Fp ]
109 °F
| [form ]
crystal | [color ]
colorless to pale yellow | [Specific Gravity]
1.40 | [Hydrolytic Sensitivity]
8: reacts rapidly with moisture, water, protic solvents | [Sensitive ]
moisture sensitive, store cold | [InChIKey]
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N | [CAS DataBase Reference]
19782-68-4 |
| Hazard Information | Back Directory | [Uses]
Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices. | [General Description]
Please inquire for bulk quantity, pricing, and packaging options. |
|
| Company Name: |
INTATRADE GmbH
|
| Tel: |
+49 3493/605464 |
| Website: |
www.intatrade.de |
|